An industrial semiconductor fabrication facility operates three specialized chemical vapor deposition (CVD) chambers—Chamber 1, Chamber 2, and Chamber 3—to process a large batch of silicon wafers.
When Chamber 1 and Chamber 2 operate together at their respective constant rates, they can complete the entire batch in hours. When Chamber 2 and Chamber 3 operate together at their respective constant rates, they can complete the entire batch in hours.
To process a new batch, Chamber 1 operates alone for hours. Next, Chamber 2 is turned on to assist Chamber 1, and both chambers operate together for an additional hours. Finally, Chambers 1 and 2 are shut down, and Chamber 3 operates alone for hours to finish the remaining portion of the batch.
How many hours would it take Chamber 3 to process the entire batch working alone at its constant rate?
- A40 hours
- B48 hours
- C54 hours
- 60 hoursCevap
- E72 hours